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SINOMATERIAL RISINGTECH

sputter target 溅射靶材
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Hafnium dioxide sputtering target, Hafnium dioxide Target

Hafnium dioxide sputtering target, Hafnium dioxide Target
Product name : Hafnium dioxide sputtering target, Hafnium dioxide Target
Item : Hafnium dioxide sputtering target, Hafnium dioxide
Details :
Hafnium dioxide Sputtering Target, Hafnium dioxide Target

Element: Hafnium dioxide

Purity: 99.9 - 99.999%

Target Shape: plate, wafer, rectangular, square, circle, tube, step wafer, step rectangle, and customer tailored.

To provide specifications of aluminum target supporter, mammography supporter, copper target supporter, Titanium target supporter.

Target metallization services

Target bonding services.

Hafnium oxide (HfO2) is a kind of wide band-gap and high dielectric constant of ceramic materials, recently in the field of microelectronics industry in particular has been causing great concern, because it is most likely to replace the current silicon-based integrated circuits as the core device of metal Oxide semiconductor field effect transistor (MOSFET) gate dielectric layer of silicon dioxide (SiO2), to resolve the current structure of the MOSFET in the development of traditional SiO2/Si size limit problem.
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